After more than a decade of research and development, Tokyo Electron Miyagi Ltd. has introduced an innovative semiconductor etching method that achieves etch rates up to five times faster than ...
OSAKA, Japan — Mitsubishi Electric Corp. has developed a single-step, hydrofluoric acid electrochemical etching process that can achieve an aspect ratio greater than 60:1 at potentially a tenth of the ...
(Nanowerk News) Physicist Igor Kaganovich at the Department of Energy's (DOE) Princeton Plasma Physics Laboratory (PPPL) and collaborators have uncovered some of the physics that make possible the ...
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